abrasive polyurethane composition for porous polishing in japan

abrasive polyurethane composition for porous polishing grinding tool

Abrasive polyurethane composition for porous polishing grinding tool

Also known polymer composition based epoxydodecane a binder for the abrasive tool (see U.S. patent N 3510233, CL 51-295, publ. 1976) in which to create porosity and elasticity using porous nonwoven fibrous mats. The polymer composition is used

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us6899602b2 - porous polyurethane polishing pads - google patents

US6899602B2 - Porous polyurethane polishing pads - Google Patents

The porous polishing pad has a porous matrix formed from a coagulated polyurethane and a non-fibrous polishing layer. The non-fibrous polishing layer has a polishing surface with a pore count of at least 500 pores per mm 2 that decreases with

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jp5675136b2 - transparent porous material for chemical mechanical polishing - google patents

JP5675136B2 - Transparent porous material for chemical mechanical polishing - Google Patents

Japan Prior art keywords polishing pad polishing porous material polymer pad substrate Prior art date 2002-10-28 Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes

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the effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

Solid-state microcellular foaming (SSMF) proces s was used to produce porous chemical mechanical polishing (CMP) pads in a variety of pore size and po rosity range, using a variety of thermoplastic polyurethane (TPU) resin hardness.

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abrasive and polishing composition - fujimi incorporated

ABRASIVE AND POLISHING COMPOSITION - FUJIMI INCORPORATED

20/2/2014 · A polishing composition comprising the abrasive according to claim 1 and water, wherein the content of the abrasive in the polishing composition is no less than 0.1% by mass. 8. The polishing composition according to claim 7, further comprising

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abrasive polishing - an overview | sciencedirect topics

Abrasive Polishing - an overview | ScienceDirect Topics

Typical mechanical treatment methods include: abrasive blasting, coated abrasive tool treatment, grit blasting, sanding, peening, brushing, scraping, and polishing [4, 59–63]. Machining by means of coated abrasive tools is one of the most

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grinding wheel composition | keihin kogyosho co.,ltd.

Grinding Wheel Composition | KEIHIN KOGYOSHO CO.,LTD.

In this method, ceramics such as feldspar and clay is fired to bond abrasive grains together. Vitrified bonded products are widely used in general grinding field including precision grinding, because the bond allows easy adjustment of grade and

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polyurethane polishing pad - dow global technologies llc

POLYURETHANE POLISHING PAD - DOW GLOBAL TECHNOLOGIES LLC

5/3/2015 · If the polishing pad is a polyurethane material, then the polishing pad preferably has a density of 0.5 to 1.25 g/cm 3. Most preferably, polyurethane polishing pads have a density of 0.6 to 1.15 g/cm 3. For non-porous pads, typical circular or

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characteristic of fixed abrasive polishing for fused silica in anhydrous environment - sciencedirect

Characteristic of fixed abrasive polishing for fused silica in anhydrous environment - ScienceDirect

1/2/2020 · In order to overcome the shortcomings of the traditional free abrasive polishing method, hence some institutes and organizations have turned to fixed abrasive polishing. Professor Stephen D. Jacobs of the University of Rochester in the United

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us7037184b2 - polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same - google patents

US7037184B2 - Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same - Google Patents

A polishing pad for use in chemical mechanical polishing of substrates that being made of a porous structure comprising a matrix consisting of fibers, such as cotton linter cellulose bound with a thermoset resin, such as phenolic resin. The poli

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the surface structure of polishing pads for polishing using composite abrasives

The surface structure of polishing pads for polishing using composite abrasives

Cerium oxide (CeO 2) abrasives are generally used in the glass polishing because high removal rate and smooth glass surface can be obtained.However, CeO 2 abrasives have problems with dispersion of slurry and cleaning from glass surface. The

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the effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads Abaneshwar Prasad,a) George Fotou,b) and Shoutian Li Cabot Microelectronics Corporation, 870 North

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oil stones | keihin kogyosho co.,ltd.

Oil Stones | KEIHIN KOGYOSHO CO.,LTD.

Porous Polishing Stones Cutting Wheels Depressed Center Wheels Oil Stones Grinding Wheel Composition Upon Ordering Keihin DIA Oil Stones Keihin TOISHI Oil stones, as the name indicates, are artificial or natural abrasive stones which are used

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composition for polishing semiconductor layers - bian, jinru

Composition for polishing semiconductor layers - Bian, Jinru

19/7/2007 · The polishing composition optionally has a TEOS to cap selectivity of at least 2 to 1 as measured with a porous-filled polyurethane polishing pad pressure measured normal to a wafer with at least one polishing pressure less than 21.7 kPa.

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the effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads ...

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads ...

The effect of polymer hardness, pore size, and porosity on the performance of thermoplastic polyurethane-based chemical mechanical polishing pads - Volume 28 Issue 17 - Abaneshwar Prasad, George Fotou, Shoutian Li

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characteristic of fixed abrasive polishing for fused silica in anhydrous environment - sciencedirect

Characteristic of fixed abrasive polishing for fused silica in anhydrous environment - ScienceDirect

1/2/2020 · In order to overcome the shortcomings of the traditional free abrasive polishing method, hence some institutes and organizations have turned to fixed abrasive polishing. Professor Stephen D. Jacobs of the University of Rochester in the United

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morphological behavior and wear of polyurethane pads used in glass polishing process | request pdf

Morphological behavior and wear of polyurethane pads used in glass polishing process | Request PDF

The porous polyurethane polishing pads are used in the optical glass chemical mechanical polishing process. The wear of the polishing pad and morphology are important for the polishing process

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preparation of silica/ceria nano composite abrasive and its cmp behavior on hard disk substrate - sciencedirect

Preparation of silica/ceria nano composite abrasive and its CMP behavior on hard disk substrate - ScienceDirect

1/11/2010 · The polishing pad was a Rodel porous polyurethane pad. For comparison, the polishing test with traditional abrasive (commercial alumina slurry used in hard disk CMP) was conducted under the same conditions. After polishing, the substrate was

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selection guide for grinding and polishing

SELECTION GUIDE FOR GRINDING AND POLISHING

Polishing Cloth Guide Poliertuchratgeber Guide des draps de polissage OP-Felt MD/DP-Floc MD/DP-Sat MD/DP-Plus MD/DP-Dac MD/DP-Pan OP-Nat MD/DP-Mol 09.2015 / 40500063 (30 pcs) Printed in Denmark Name Name Désignation Composition

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deburring and polishing of medical instruments

Deburring and polishing of medical instruments

such as foamed polyurethane. As a result, our grinding and polishing wheels are sponge-soft, finely porous or hard, but always elastic. Depending on the application, the specifically matched composition of grain and bonding results in the

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