optimization of fixed abrasive polishing slurry for lib3o5

optimization of fixed abrasive polishing slurry for lib3o5

Optimization of Fixed Abrasive Polishing Slurry for LiB3O5

Optimization of Fixed Abrasive Polishing Slurry for LiB3O5 Crystal Article in Kuei Suan Jen Hsueh Pao/ Journal of the Chinese Ceramic Society 41(6) · June 2013 with 20 Reads How we measure 'reads'

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lbo lib3o5 mono-crystal and polished wafer

LBO LiB3O5 mono-crystal and polished wafer

It is rather difficult to process LiB3O5(LBO) nonlinear optical crystal by ultraprecision machining due to its soft and brittle properties.The LBO crystal(110) surface was polished by using a fixed abrasive polishing technology.The effects of acidic neutral and alkaline slurry pH regulator and pH value on the removal rate of crystal polishing

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optimization of polishing parameters with taguchi method

Optimization of Polishing Parameters with Taguchi Method

However, the abrasive-free alkaline slurry with ethylenediamine and pH value of 11 can be effective for fixed abrasive polishing of LBO crystal (110) surface, obtaining a high surface quality of

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influence of acid slurries on surface quality of lbo crystal

Influence of acid slurries on surface quality of LBO crystal

The chemical action, which is generally determined by acid or alkaline regulator in the slurry, plays an important role in fixed abrasive chemical mechanical polishing (CMP). Experiments were conducted to explore the influence of acid slurries on surface quality and material removal in fixed abrasive CMP of LBO (LiB3O5) crystal with soft and brittle, difficult-machining properties. Four

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ultra-precision machining of lbo crystal | request pdf

Ultra-precision machining of LBO crystal | Request PDF

Optimization of Fixed Abrasive Polishing Slurry for LiB3O5 Crystal surface was polished by using a fixed abrasive polishing technology. is 0.4 nm and the MRR is 100.4 nm/min when CeO2was

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yongwei zhu's research works | nanjing university of

Yongwei Zhu's research works | Nanjing University of

Compared to free abrasive CMP, the abrasive is fixed in the polishing pad. Diamond abrasives were chosen and fixed in FAP with Cu power in this study [21][22] [23]. An abrasive-free slurry which

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polishing slurry - an overview | sciencedirect topics

Polishing Slurry - an overview | ScienceDirect Topics

The abrasives in DI water are dispersed using an agitator to remove any abrasive agglomeration. The chemical that was separated from the original polishing slurry became the abrasive-less polishing slurry. Both slurries were used in the polishing test using the oxide wafer and material removal per sliding distance was measured (Figure 1.9). The

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fixed abrasive lapping and polishing of hard brittle

Fixed Abrasive Lapping and Polishing of Hard Brittle

Compared to free abrasive CMP, the abrasive is fixed in the polishing pad. Diamond abrasives were chosen and fixed in FAP with Cu power in this study [21] [22][23]. An abrasive-free slurry which

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